In this paper, the authors review the development and application of coherent short wavelength light sources implemented using the high harmonic generation (HHG) process, such as the KMLabs by Brad Sohnlein
In this paper, the authors review the development and application of coherent short wavelength light sources implemented using the high harmonic generation (HHG) process, such as the KMLabs by Brad Sohnlein
Tags: High Harmonic, XUUS, Ti:Sapphire, HHG, Coherent Diffractive Imaging, Mask Inspection, Phase Retrieval, X-Ray Imaging, Semiconductor, EUV, imaging, lithography, nanoscale characterization, semiconductor technology, VUV, ARPES, time-resolved ARPES, extreme ultraviolet source, materials characterization, quantum, soft X-ray, surface-to-near-surface, ultrafast spectroscopy
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Ultrathin films and multilayers, with controlled thickness down to single atomic layers, are critical for advanced technologies ranging from nanoelectronics to spintronics to quantum devices. However, for thicknesses less than 10 nm, surfaces and dopants contribute significantly to the film properties, ...
Tags: High Harmonic, XUUS, Ti:Sapphire, HHG, Semiconductor, EUV, imaging, nanoscale characterization, semiconductor technology, extreme ultraviolet source, nanostructures, materials characterization, surface-to-near-surface, ultrafast spectroscopy
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The vacuum ultraviolet (VUV) spectral region, covering approximately 6–15 eV, has a unique ability to probe physical and chemical processes. This range of the electromagnetic spectrum is often used as an ionization source in angle-resolved photoelectron spectroscopy (ARPES) and photoionization mass spectrometry (PIMS), or to initiate ...
Tags: nanoscale characterization, photon absorption, VUV, ARPES, time-resolved ARPES, PIM, chemical combustion, materials characterization, spectroscopy, ultrafast spectroscopy, ytterbium fiber, Atom Probe Tomography, highly cascaded harmonic generation
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