In this paper, the authors review the development and application of coherent short wavelength light sources implemented using the high harmonic generation (HHG) process, such as the KMLabs by Brad Sohnlein
In this paper, the authors review the development and application of coherent short wavelength light sources implemented using the high harmonic generation (HHG) process, such as the KMLabs by Brad Sohnlein
Tags: High Harmonic, XUUS, Ti:Sapphire, HHG, Coherent Diffractive Imaging, Mask Inspection, Phase Retrieval, X-Ray Imaging, Semiconductor, EUV, imaging, lithography, nanoscale characterization, semiconductor technology, VUV, ARPES, time-resolved ARPES, extreme ultraviolet source, materials characterization, quantum, soft X-ray, surface-to-near-surface, ultrafast spectroscopy
Read NowUltrathin films and multilayers, with controlled thickness down to single atomic layers, are critical for advanced technologies ranging from nanoelectronics to spintronics to quantum devices. However, for thicknesses less than 10 nm, surfaces and dopants contribute significantly to the film properties, ...
Tags: High Harmonic, XUUS, Ti:Sapphire, HHG, Semiconductor, EUV, imaging, nanoscale characterization, semiconductor technology, extreme ultraviolet source, nanostructures, materials characterization, surface-to-near-surface, ultrafast spectroscopy
Read NowWith increasingly 3D devices becoming the norm, there is a growing need in the semiconductor industry and in materials science for high spatial resolution, non-destructive metrology techniques capable of determining ...
Tags: Coherent Diffractive Imaging, Semiconductor, EUV
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