The webinar hosted on 3/24 by the OSA Short Wavelength Sources and Attosecond/High Field Physics Technical Group showcased a very recent important technological application of attosecond science in...
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Recap of 3/24 OSA webinar "High-Harmonic Sources for Material Development and Metrology in the Semiconductor Industry"
Attolab uses KMLabs' 13nm EUV source to demonstrate the high-NA capabilities of EUV interference lithography
Imec, a world leader in nanoelectronics and digital technologies, reported using KMLabs' 13.5 nm XUUS high harmonic generation source for printing 20nm pitch line/spaces using interference...
World's first phase-sensitive EUV imaging reflectometer on 3D nanostructure characterization
KMLabs, STROBE Science and Technology Center at CU Boulder, and imec's Attolab have worked collaboratively to present the world's first phase-sensitive extreme ultraviolet (EUV) imaging reflectometer.
Replay ICALEO Talk: Update on imec's attolab
Seth Cousin, Director of Products at KMLabs, gave a CLEO talk discussing KMLabs' collaboration with imec: attolab. The aim of imec's attolab is to study ultrafast kinetics of EUV exposure processes...
Come see us at CLEO during the virtual sessions
Our very own, Dan Hickstein (Product Manager of the Hyperion VUV Laser System) and Seth Cousin (Director of Products) have CLEO talks on May 13th and 14th during the virtual technical sessions....
KMLabs, Inc. Introduces QM Quantum Microscope
Boulder, Colorado, June 25, 2019 ––– KMLabs, Inc., the leader in ultrafast laser technology, today introduces the QM Quantum Microscope for next-generation imaging and analysis. This system is built...
Finding The Source Of EUV Stochastic Effects
Resolving problems in advanced lithography could push this technology much more into the mainstream, but that won’t be easy.